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What technology will enable lithography to continue Moore's law beyond 10 nm node? Traditional photolithography, using a 193 nm wavelength and chemically amplif

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist material

Photolithography remains the most efficient method to create semiconductor devices. Moore's law states that the number of transistors per integrated circuit wil

As feature sizes continue to shrink, the need for new materials and new processes for next-generation lithography becomes more urgent. Although aqueous base dev

LIG is a revolutionary technique that uses a common CO2 infrared laser scriber, like the one used in any machine shop, for the direct conversion of polymers int