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This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations

The papers contained in the volume represent lectures delivered as a 1983 NATO ASI, held at Urbino, Italy. The lecture series was designed to identify the key s

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were